测量了四种典型镍镀层的采透火和退火试样的正电子湮没寿命谱。
The experimental results indicated that the film resistivity of the sample annealed was reduced significantly and only one 3.17 of the unannealed.实验结果表明:退火后样品的薄膜电阻率显著减小,是未退火样品薄膜电阻率的3.17分之一;
XRD structural analysis shows that peak intensity of the annealed sample is greater than that of the unannealed one which demonstrated an increase of crystallinity.XRD结构分析显示,退火后薄膜样品的峰值强度大于未退火样品的强度,说明样品结晶度增强。